2004 | ISBN-10: 0824757882 | 840 pages | PDF | 36 MB
Providing in-depth coverage of the technologies and various approaches, Luminous Chemical Vapor Deposition and Interface Engineering showcases the development and utilization of LCVD procedures in industrial scale applications. It offers a wide range of examples, case studies, and recommendations for clear understanding of this innovative science.
The book comprises four parts. Part 1 describes the fundamental difference between glow discharge of an inert gas and that of an organic vapor, from which the concepts of Luminous Gas Phase derive. Part 2 explores the various ways of practicing Luminous Vapor Disposition and Treatment depending on the type and nature of substrates. Part 3 covers some very important aspects of surface and interface that could not have been seen clearly without results obtained by application of LCVD. Part 4 offers some examples of interface engineering that show very unique aspects of LCVD interface engineering in composite materials, biomaterial surface and corrosion protection by the environmentally benign process.
Timely and up-to-date, the book provides broad coverage of the complex relationships involved in the interface between a gas/solid, liquid/solid, and a solid/solid. The author presents a new perspective on low-pressure plasma and describes key aspects of the surface and interface that could not be shown without the results obtained by LCVD technologies.
Features
Provides broad coverage of complex relationships involved in interface between a gas/solid, a liquid/solid, and a solid/solid
Addresses the importance of the initial step of creating electrical glow discharge
Describes the principles of creating chemically reactive species and their growth in the luminous gas phase
Focuses on the nature of surface-state of solid and on the creation of imperturbable surface-state by the contacting phase or environment, which is vitally important in creating biocompatible surface, providing super corrosion protection of metals by environmentally benign processes, etc.
Offers examples on how to use LCVD in the interface engineering process
Presents a new view on low-pressure (low-temperature) plasma and emphasizes the importance of luminous gas phase and chemical reactions that occur in the phase